学术报告（7月11-12日）

Contents:
Focused electron beam induced processing for 3 dimensional structuring
Origin, early applications, metal-compound deposition
Energies employed for the process and obtained results
Nanostructure of the deposited materials
Field electron emitters, diodes and triodes
High frequency devices, shot noise and signal to noise ratio for amplifiers
Smith Purcell THz device  as a tunable mW radiation source
Dynatron THz Oscillator and 1 W THz radiation source
Possible applications

题目2：Field Emission X-ray Sources

时间：2015年7月12日上午：9:30-11:30

Contents:
Koops-GranMat®, a nanogranular matrix compound material
Comparison of current density conduction to metals and superconductors
Conduction with Koops-Pairs  and a Bose-Einstein Condensate at room temperature
The influence of grain size on the existence of phonon energy states
Electron supply from normal metal to Koops-GranMat® by Maxwell statistics
Brightness of X-ray sources
Heat dissipation in the anode material, solid and liquid anodes
Anode made from Koops-GranMat®. Deceleration of scattered electrons
Design of a Brachytherapy X-Ray source for minimal invasive irradiations

主持人：刘飞 副教授

欢迎广大师生踊跃参加！

报告人简介：
    Prof. Koops was born in Jena (Thüringen)，Germany. He received his Ph.D. degree in University Tübingen in 1971. Dr.Koops focuses on the electron optics, beams systems, Aberration measurement and correction in TEM and SEM. Prof. Koops was respectively the group leader “Electron Beam Projection Lithography” in TU Darmstadt, the head of Electron beam Lithography group at the Deutsche Telekom Research Center in Darmstadt (Germany), the head of Technology and Chief Scientist of NaWoTec GmbH, and the CEO of HaWilKo GmbH Ober- Ramstadt in the past years. In 2003, NaWoTec obtained the German Business Innovation Award for developing an electron beam based photo mask repair tool for the semiconductor technology under his excellent leadership.
    Dr. Koops has published over 170 papers and obtained 60 Patents in the field of optics, electron optics and lithography. He was elected to the Chairman of 1999 International Vacuum Nanoelectronics Conference (IVNC) and the Chairman of the International Steering Committee (ISC) from 2000 to 2005 due to his outstand contribution to the vacuum electronics area.